[1]林威豪,马晔城,陈胜男,等.AACVD方法制备FTO薄膜及其结构与光电性能研究[J].燕山大学学报,2018,42(3):234-239.[doi:10.3969/j.issn.1007-791X.2018.03.007]
 LIN Weihao,MA Yecheng,CHEN Shengnan,et al.Study on structure,optical and electrical properties of FTO thin films prepared by aerosol-assisted chemical vapor deposition[J].Journal of YanShan University,2018,42(3):234-239.[doi:10.3969/j.issn.1007-791X.2018.03.007]
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AACVD方法制备FTO薄膜及其结构与光电性能研究
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《燕山大学学报》[ISSN:1007-791X/CN:13-1219/N]

卷:
42
期数:
2018年第3期
页码:
234-239
栏目:
材料科学与工程
出版日期:
2018-05-31

文章信息/Info

Title:
Study on structure,optical and electrical properties of FTO thin films prepared by aerosol-assisted chemical vapor deposition
文章编号:
1007-791X(2018)03-0234-06
作者:
林威豪12马晔城12陈胜男12汪建勋12韩高荣12*
 1.浙江大学 材料科学与工程学院,浙江 杭州 310027;2.硅材料国家重点实验室,浙江 杭州 310027
Author(s):
 LIN Weihao12MA Yecheng12CHEN Shengnan12WANG Jianxun12HAN Gaorong12
1.School of Materials Science and Engineering,Zhejiang University,Hangzhou,Zhejiang 310027,China; 2.State Key Laboratory of Silicon Materials,Hangzhou,Zhejiang 310027,China
关键词:
气溶胶辅助化学气相沉积FTO薄膜低辐射性能
Keywords:
aerosol-assistedchemical vapor depositionFTO thin filmslow-emission
分类号:
TQ172.1
DOI:
10.3969/j.issn.1007-791X.2018.03.007
文献标志码:
A
摘要:
以单丁基三氯化锡为Sn源,氟化铵为F源,甲醇为溶剂,采用超声雾化-气溶胶辅助气相化学沉积方法制备了均匀的FTO(SnO2:F)透明导电薄膜。运用X射线衍射、场发射扫描电子显微镜、原子力显微镜、透射电子显微镜、霍尔效应测试仪等方法研究了镀膜时间对FTO薄膜微观结构和光电性能的影响规律。结果表明,薄膜物相为(200)晶面择优生长的金红石相SnO2;随镀膜时间增加,薄膜表面颗粒粗化,厚度近似呈线性增加;镀膜时间每延长2 min,可见光区主波长(550 nm)透过率下降约10%,中远红外光区平均反射率先增大后减小,电阻率先减小后增大。在本文实验条件下,薄膜厚度可从约250 nm增加至约2 200 nm,电阻率在2.89×10-4~6.69×10-4 Ω·cm之间,依据中远红外反射光谱计算半球辐射率在0.21~0.40之间,为进一步的性能优化提供了实验基础。
Abstract:
Fluorine doped tin oxide (FTO) has been widely used in in a variety of applications including for glazing, flat panel displays and solar panels,usually as electrodes. In the present work, a homogeneous dense FTO thin film has been deposited on glass substrates by using aerosol-assisted chemical vapor deposition. The structure, optical and electrical properties of the thin film were studied by X-ray diffraction, scanning electron microscopy, transmission electron microscopy, scanning probe microscopy, UV-Vis spectrophotometer and infrared spectroscopy. The results show that the main phase of the film is cassiterite form which obviously favour the (200) plane upon increased deposition times. Besides, the transmittance of the visible region decreases by about 10%, and the reflectivity of the middle-far infrared region increases first and then decreases with the increase of the film thickness. The resistivity decreases first and then decreases, leading to the best calculated hemisphere emittance of the film which is about 0.19. The above results show that FTO films have the potential for high quality low-e coatings and (200) crystal face preferred growth is benefiacl for improving the conductivity.

备注/Memo

备注/Memo:
收稿日期:2017-06-29      责任编辑:王建青
基金项目:国家重点研发计划资助项目(2016YFB0303900)
作者简介:林威豪(1995-),男,浙江台州人,硕士研究生,主要研究方向为功能镀膜玻璃;*通信作者:韩高荣(1962-),男,浙江余姚人,博士,教授,博士生导师,主要研究方向为无机非金属材料、特种玻璃,Email:hgr@zju.edu.cn
更新日期/Last Update: 2018-07-16